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Novel radiation processing of polymer in aqueous system
-Adsorbent being capable of removing metal ion with 2000 times' rate-
Jan. 25 , 2010
High performance adsorbent fabric in removal of metal ions was developed by collaboration of Japan Atomic Energy Agency (JAEA) and Kurashiki Textile Manufacturing Co. Ltd. Emulsion graft polymerization is a key technology which can lead effective grafting and practical production cost in the present development. The emulsion graft polymerization is environmental-friendly aqua reaction system without using organic solvent. Moreover, the necessary dose can be reduced to one tenth of that in organic solvent system.
Nowadays, ultra pure water in washing process is inevitable for highly integrated circuits. Metal ion adsorbent need high treatment rate of water as well as less elution from adsorbent itself. Kurashiki Textile Manufacturing Co. Ltd produced the nonwoven fabric of 100 % polyethylene which elute little amount of organic substances such as unreacted monomer and additives. Then, JAEA imparted the sulfonic acid onto this nonwoven fabric by emulsion graft polymerization and subsequent chemical treatment. The synthesis process was optimized at dose of 50 kGy. This dose is one forth of the grafting in the organic solvent. The resulting adsorbent fabric is expected to be the purification filter for ultra pure water to wash the semiconductor. This is because the treatment rate is 2000 times faster than that of the commercialized spherical resins and the elution from adsorbent was lower than the detection limits. Kurashiki Textile Manufacturing Co. Ltd. is planning to provide new adsorbent fabrics as filter materials in Q2, 2010.
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